UV Quartz Glass Plate for Semiconductor Photomask Large Size High Temperature Resistant Fused Silica Sheet
Produktdetails
| Typ: | Klare Quarzplatte | Anwendung: | Halbleiter, optisch |
|---|---|---|---|
| Dicke: | 0,5-100 mm | Form: | Quadrat |
| Bearbeitungsservice: | Stanzen, Schneiden | Produktname: | Quarzglasplatte |
| Material: | SiO2 | SiO2: | SiO2> 99,99% |
| Dichte: | 2,2 g/cm3 | Farbe: | Klar transparent |
| Arbeitstemperatur: | 1100℃ | Schmelzpunkt: | 1732℃ |
| Hafen: | Hafen von Shanghai und Qindao | ||
| Hervorheben |
UV quartz glass plate,large fused silica sheet,high temperature resistant photomask |
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Produktbeschreibung
Produkt-Highlights
High-purity (99.99% SiO₂) fused silica quartz glass plates engineered for semiconductor photomask and wafer manufacturing. These high-temperature-resistant, corrosion-resistant rectangular and square sheets are available in JGS1, JGS2, and JGS3 grades, with custom frosted plate options manufactured ...
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