High Purity Optical Quartz Window for Semiconductor Equipment
Produktdetails
| SIO2 -Inhalt: | >99,99% | Dichte: | 2.2 g/cm3 |
|---|---|---|---|
| Härte: | Mohs 6,5-6,6 | Arbeitstemperatur: | 1100°C-1200°C |
| Dicke: | 0,3-100 mm | Sichtbare Durchlässigkeit: | > 93% |
| Hervorheben |
optical quartz window semiconductor,high purity fused quartz plate,quartz window semiconductor equipment |
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Produktbeschreibung
Produkt-Highlights
Hochreine Quarzfenster (SiO2>99,99 %) mit Morsehärte 6,5 und 1200 °C Arbeitstemperatur. Sondergrößen 0,3–100 mm, polierte 40/20-Oberflächenqualität. Ideal für Halbleitergeräte, optische Instrumente und Hochtemperatur-Schaugläser. Muster verfügbar, niedrige MOQ, 15-Tage-Lieferung.
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